Clinton Township-based II-VI Inc. announced Monday its introduction of heated ion implantation foundry services.

II-VI Inc. announced Monday what it calls the “most advanced ion implantation foundry services.”

The services, according to the Clinton Township-based company, help produce at scale 150-mm silicon carbide wafers, which II-VI said are in increased demand given the growing interest in clean energy and the electrification of global energy and transportation infrastructure.

II-VI contends the process eliminates defects in the silicon wafers and dynamically heats and cools the crystal structures inside the wafers. This, according to II-VI, allows the company to produce a high level of precision in both depth and concentration.

“To our knowledge, II-VI is the first foundry in the world to provide such advanced ion implantation services commercially for 150 mm SiC wafers and we plan to scale to 200 mm in the future,” said II-VI executive vice president Sohail Khan. “II-VI's new ion implantation process is extremely versatile: It delivers a broad energy range from 10 keV to 1 MeV and can be heated or unheated for a wide range of compound semiconductor wafer materials and devices. This process is compatible with a vast array of materials, including silicon and diamond for special-purpose applications as well as those that can be integrated into wafer-scale optics platforms.”